Título

HARDNESS EVALUATION, STOICHIOMETRY AND GRAIN SIZE OF TITANIUM NITRIDE FILMS OBTAINED WITH PLASMA NITRIDING ON Ti-6Al-4V SAMPLES

HARDNESS EVALUATION, STOICHIOMETRY AND GRAIN SIZE OF TITANIUM NITRIDE FILMS OBTAINED WITH PLASMA NITRIDING ON Ti-6Al-4V SAMPLES

Autoria

Vasconcellos, Marcos Antonio Zen; Lima, Saulo Cordeiro; Hinrichs, Ruth

Vasconcellos, Marcos Antonio Zen

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Lima, Saulo Cordeiro

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Hinrichs, Ruth

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DOI

10.5151/2594-5327-33501

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Resumo

Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X- Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.

Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X- Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.

Palavras-chave

glow discharge, nitride, Hardness

glow discharge, nitride, Hardness