ISSN 2594-5327
65º Congresso ABM — Vol. 65, Num. 65 (2010)
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Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X- Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.
Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X- Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.
Palavras-chave
glow discharge, nitride, Hardness
glow discharge, nitride, Hardness
Como citar
Vasconcellos, Marcos Antonio Zen; Lima, Saulo Cordeiro; Hinrichs, Ruth.
HARDNESS EVALUATION, STOICHIOMETRY AND GRAIN SIZE OF TITANIUM NITRIDE FILMS OBTAINED WITH PLASMA NITRIDING ON Ti-6Al-4V SAMPLES,
p. 5205-5211.
In: 65º Congresso ABM,
Rio de Janeiro,
2010.
ISSN: 2594-5327, DOI 10.5151/2594-5327-2019-12014-33501