ISSN 2594-5327
55º Congresso anual — Vol. 55 , num. 1 (2000)
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It is difficult to process steel sheet with a high Si content (>3.5%Si), mainly because of its brittleness and the appearance of cracks during rolling and oxidation. However, there is a market for this steel in electrical applications because of the favourable influence of Si on magnetostriction and electrical resistivity. There are alternative methods to obtain high Si-contents, avoiding the rolling problems, e.g. PVD of Si on sheet steel, followed by diffusion annealing. As an alternative process, 3% Si steel substrates were coated with hypereutectic Al-Si-alloys in a “hot-dip simulator”. The obtained layers were characterised and diffusion annealing experiments were performed to obtain sufficient amount of Si in solution in the bulk of the steel, in order to increase the electrical resistivity and thus decrease the magnetic losses of magnetic materials.
It is difficult to process steel sheet with a high Si content (>3.5%Si), mainly because of its brittleness and the appearance of cracks during rolling and oxidation. However, there is a market for this steel in electrical applications because of the favourable influence of Si on magnetostriction and electrical resistivity. There are alternative methods to obtain high Si-contents, avoiding the rolling problems, e.g. PVD of Si on sheet steel, followed by diffusion annealing. As an alternative process, 3% Si steel substrates were coated with hypereutectic Al-Si-alloys in a “hot-dip simulator”. The obtained layers were characterised and diffusion annealing experiments were performed to obtain sufficient amount of Si in solution in the bulk of the steel, in order to increase the electrical resistivity and thus decrease the magnetic losses of magnetic materials.
Palavras-chave
electrical-steels, hot-dipping, high-silicon-steel
electrical-steels, hot-dipping, high-silicon-steel
Como citar
Yáñez, Tanya Ros; Prado, Marta; Houbaert, Yvan.
PRODUCTION OF HIGH SILICON STEEL THROUGH HOT-DIPPING AND DIFFUSION ANNEALING,
p. 1882-1890.
In: 55º Congresso anual,
Rio de Janeiro, Brasil,
2000.
ISSN: 2594-5327, DOI 10.5151/2594-5327-C00934
